The production of trichlorosilane mostly adopts boiling chlorination, mainly including the synthesis of hydrogen chloride, trichlorosilane synthesis, trichlorosilane refining and other processes. Chlorine gas and hydrogen gas generate hydrogen chloride through combustion reaction in the hydrogen chloride synthesis furnace. The process is basically the same as that of hydrogen chloride synthesis in calcium carbide PVC generation. Hydrogen chloride gas is collected and dehydrated by air cooling, water cooling, cryogenic cooling and acid fog, and then sent to hydrogen chloride buffer tank and trichlorosilicon synthesis furnace. After drying, silicon powder is added to the trichlorosilicon synthesis furnace, and reacts with hydrogen chloride at about 300℃ to produce trichlorosilicon and tetraclorosilicon. Generated by the coarse silicon chemical hydrogen gas after cyclone separation and dust removal filter into the shell and tube condenser water cooling and cryogenic non-condensable gas by liquid seal for exhaust gas scrubber, after processing standards, condensate distillation separation and purification tower, usually adopt two continuous purification tower, a tower line low boiling, the two tower bottom row of high boiling silicon tetrachloride, at the same time the top chemical hydrogen silicone products.