Photoresist: KrF (248 nm) photoresist and ArF photoresist (193 nm) for large and very large integrated circuits. The scale of a single unit is 10 tons/year.
2. Ultra-high purification reagents: hydrochloric acid, nitric acid: single metal impurity content <100 ppt, particles (≥0.2 μm) <100/ml. High purity ammonia water, hydrogen peroxide, sulfuric acid, ammonium hydrogen fluoride, hydrofluoric acid: electronic grade, metal ion ≤ 10 ppb; particle ≤ 100 (≥ 0.5 μm); semiconductor grade, metal impurity content ≤ 0.1 ppb; control particle size ≤ 0.2 μm. The scale of a single unit is 5,000 tons/year.
3. Special electronic gas: high purity chlorine gas, hydrogen chloride, decane: purity ≥ 99.999%; carbon oxysulfide, diborane: purity ≥ 99.99%; arsine, phosphine, disilane: purity ≥ 99.9999%. The scale of the device: high purity phosphane, high purity arsenic, high purity decane up to 50 tons / year; high purity chlorine, high purity hydrogen chloride, high purity hydrogen bromide up to 500 tons / year; high purity disilane to 5 tons / year.
4. A new generation of special chemicals for lithium-ion batteries: high specific energy silicon carbon anode (1700 ~ 2000 mAh / g, energy density: 300 ~ 350 wh / kg), a single set of scale 5,000 tons / year; new electrolyte double ( Lithium trifluoromethylsulfonyl)imide and lithium bis(fluorosulfonyl)imide. The single unit scale is 500 tons/year, and the purity and other comprehensive properties meet the needs of a new generation of lithium batteries.